Titanium dioxide (TiO2) target
Titanium oxide used in semiconductor manufacturing processes, recording media such as HDDs, and thin film formation for flat panel displays!
■ Purity > 99.9% ■ Density (4.49 g/cm³) ■ Manufacturing Method: HIP *For more details, please download the PDF or feel free to contact us.*
- 企業：SPUTTERCORE CO.,LTD.
- 価格：Other
