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Titanium dioxide (TiO2) target

Titanium dioxide (TiO2) target

Titanium oxide used in semiconductor manufacturing processes, recording media such as HDDs, and thin film formation for flat panel displays!

■ Purity > 99.9% ■ Density (4.49 g/cm³) ■ Manufacturing Method: HIP *For more details, please download the PDF or feel free to contact us.*

  • Other metal materials
  • Composite Materials
  • Titanium oxide target

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